朱慧超

个人信息Personal Information

副教授

硕士生导师

性别:男

毕业院校:吉林大学

学位:博士

所在单位:控制科学与工程学院

学科:检测技术与自动化装置. 模式识别与智能系统. 导航、制导与控制

办公地点:海山楼A1117

联系方式:zhuhuichao@dlut.edu.cn

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Resistive Switching Behavior in Amorphous Aluminum Oxide Film Grown by Chemical Vapor Deposition

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论文类型:期刊论文

发表时间:2014-07-01

发表刊物:CHINESE PHYSICS LETTERS

收录刊物:SCIE、ISTIC、Scopus

卷号:31

期号:7

ISSN号:0256-307X

摘要:The repeatable bipolar resistive switching phenomenon is observed in amorphous Al2O3 prepared by metal-organic chemical vapor deposition on ITO glass, with ITO as the bottom electrode and Ag as the top electrode. The crystal structure, morphology, composition and optical properties of Al2O3 thin films are investigated by x-ray diffraction, x-ray photoelectron spectroscopy, atomic force microscopy and ultraviolet-visible-infrared spectroscopy, respectively. The electronic character of Ag/Al2O3/ITO structure is tested by an Agilent B1500A. The device shows a typical bipolar resistive switching behavior under the dc voltage sweep mode at room temperature. The variation ratio between HRS and LRS is larger than nearly three orders of magnitude, which indicates the good potential of this structure in future resistive random access memory (ReRAM) applications. Based on the conductive filament model, the high electric field is considered the main reason for the resistive switching according to our measurements.