location: Current position: Home >> Scientific Research >> Paper Publications

ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams

Hits:

Indexed by:会议论文

Date of Publication:2018-01-01

Pre One:Effect of plasma uniformity on etching profiles

Next One:Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored bias waveforms