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2015 英特尔国家大学生创新创业训练计划:化学机械抛光 (CMP)硅晶圆材料去除率和抛光垫磨损率模拟仿真

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Leading Scientist:Dong Zhigang

Supported by:国际合作项目

Status:结题

Supported by:Intel Semiconductor (US) LLC

Nature of Project:纵向

Date of Project Approval:2015-11-16

Scheduled completion time:2016-06-30

Date of Project Initiation:2015-11-16

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