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Numerical simulation of temporal and spatial sheath evolution in plasma source ion implantation

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Indexed by:会议论文

Date of Publication:1995-01-01

Included Journals:CPCI-S

Volume:1

Page Number:427-430

Pre One:等离子体源离子注入装置中离子到达靶表面的能量和角分布

Next One:等离子体源离子注入鞘层时空演化的研究
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