Simulation of atomic layer etching of Si in inductively coupled argon/chlorine plasmas with tailored bias voltage waveforms
Release Time:2019-03-12 Hits:
Indexed by: Conference Paper
Date of Publication: 2016-01-01
Page Number: 51-51
Release Time:2019-03-12 Hits:
Indexed by: Conference Paper
Date of Publication: 2016-01-01
Page Number: 51-51