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Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for N2/Ar discharges

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Indexed by:期刊论文

Date of Publication:2016-01-01

Journal:CHINESE PHYSICS B

Included Journals:ISTIC

Issue:25

Page Number:105206-105206

Pre One:Simulation of atomic layer etching of Si in inductively coupled argon/chlorine plasmas with tailored bias voltage waveforms

Next One:Experimental investigations of the plasma radial uniformity in single and dualfrequency capacitively coupled argon discharges
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