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Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms

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Indexed by:期刊论文

Date of Publication:2017-01-01

Journal:Plasma Sci. Technol.

Volume:19

Issue:6

Page Number:85502-85502

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Next One:Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O2 Discharges by Using a Hybrid Model
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