location： Current position: Home >> Scientific Research >> Paper Publications

Ion Energy and Angular Distribution in Biased Inductively Coupled Ar/O2 Discharges by Using a Hybrid Model

Hits:

Indexed by:期刊论文

Date of Publication:2017-01-01

Journal:PLASMA PROCESSES AND POLYMERS

Volume:14

Page Number:1600100-

Pre One:Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms

Next One:Fluid simulation of species concentrations in capacitively coupled N2/Ar plasmas: Effect of gas proportion
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep