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Indexed by:期刊论文

Date of Publication:2011-02-01

Journal:PLASMA SCIENCE & TECHNOLOGY

Included Journals:Scopus、SCIE、EI

Volume:13

Issue:1

Page Number:61-67

ISSN No.:1009-0630

Key Words:dual frequency; capacitively coupled plasma; optical probe; plasma uniformity

Abstract:Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma (DF-CCP) reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low-frequency (LF) power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.