Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2011-02-01

Journal: PLASMA SCIENCE & TECHNOLOGY

Included Journals: EI、SCIE、Scopus

Volume: 13

Issue: 1

Page Number: 61-67

ISSN: 1009-0630

Key Words: dual frequency; capacitively coupled plasma; optical probe; plasma uniformity

Abstract: Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma (DF-CCP) reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low-frequency (LF) power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.