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Indexed by:期刊论文

Date of Publication:2010-03-01

Journal:REVIEW OF SCIENTIFIC INSTRUMENTS

Included Journals:SCIE、EI

Volume:81

Issue:3

ISSN No.:0034-6748

Key Words:cyclotron resonance; electron density; high-frequency discharges; hydrogen; plasma density; plasma sources; plasma temperature

Abstract:Hybrid hydrogen plasma was formed by biasing 13.56 MHz radio-frequency (rf) power on a substrate immersed in 2.45 GHz microwave electron cyclotron resonance (ECR) plasma. The influences of the substrate configuration on plasma characteristics were investigated. With increasing rf self-bias voltage, electron temperature, T(e), increases obviously in the case of the single-electrode substrate, whereas a slight change in T(e) was observed with the double-electrode substrate condition. Electron density rises almost with a same magnitude under both two substrate conditions. It exhibited that electron energy and density in ECR-rf hybrid mode could be adjusted independently by controlling rf discharge with favorable substrate configurations.