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论文类型：期刊论文

发表时间：2012-02-01

发表刊物：PLASMA SCIENCE & TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：14

期号：2

页面范围：107-110

ISSN号：1009-0630

关键字：pulsed modulation; SiH4/N-2/O-2 discharge; capacitively coupled plasma; fluid model

摘要：Driven by pulse modulated radio-frequency source, the behavior of SiH4/N-2/O-2 plasma in capacitively coupled discharge are studied by using a one-dimensional fluid model. Totally, 48 different species (electrons, ions, neutrals, radicals and excited species) are involved in this simulation. Time evolution of the particle densities and electron temperature with different duty cycles are obtained, as well as the electronegativity n(SiH3-)/n(e) of the main negative ion (SiH3-). The results show that, by reducing the duty cycle, higher electron temperature and particle density can be achieved for the same average dissipated power, and the ion energy can also be effectively reduced, which will offer evident improvement in plasma deposition processes compared with the case of continuous wave discharge.