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Influence of N2 flux on film deposition on sapphire(0001) substrates by ECR－PEMOCVD

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Indexed by:期刊论文

Date of Publication:2011-01-01

Journal:中国物理快报（英文版）

Volume:28

Issue:2

Page Number:281021-281024

Pre One:Study on Al(x)Ni(y) Alloys as Diffusion Barriers in Flexible Thin Film Solar Cells

Next One:The Preparation and Charateristics of InxGa1-xN（0.06 ≤x≤ 0.58） Films
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