Current position: Home >> Scientific Research >> Paper Publications

Preparation and Characteristics of GaN Films on Freestanding CVD Thick

Release Time:2022-10-08  Hits:

Date of Publication: 2022-10-08

Journal: Chinese Physics Letters

Institution: 物理学院

Volume: 27

Issue: 1

Page Number: 181021-181024

Prev One:Plasma pretreatment of GaAs substrates and ECR-PAMOCVD of cubic GaN

Next One:Preparation and Characteristics of GaN Films on Freestanding CVD Thick Diamond Films
Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Browse on mobile