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Preparation and Characteristics of GaN Films on Freestanding CVD Thick

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Date of Publication:2022-10-08

Journal:Chinese Physics Letters

Affiliation of Author(s):物理学院

Volume:27

Issue:1

Page Number:181021-181024

Pre One:Plasma pretreatment of GaAs substrates and ECR-PAMOCVD of cubic GaN

Next One:Preparation and Characteristics of GaN Films on Freestanding CVD Thick Diamond Films
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