location： Current position: Home >> Scientific Research >> Paper Publications

碳化硅MOS器件氧化层界面附近碳存在形式的理论研究进展

Hits:

Date of Publication:2022-10-06

Journal:智能电网

Affiliation of Author(s):物理学院

Volume:6

Issue:1

Page Number:12-17

Note:新增回溯数据

Pre One:石墨衬底上低维ZnO纳米材料的生长(英文)

Next One:等离子体清洗GaAs和Al2O3衬底的RHEED图像分析
Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep