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Professor Supervisor of Master's Candidates

Other Post:三束实验室常务副主任

Paper Publications

[21]Qian, Muyang, Li, Gui, Kang, Jinsong, Liu, Sanqiu, Chunsheng Ren, zhangjialiang, Wang Dezhen.Fluid modeling of radical species generation mechanism in dense methane-air mixture streamer di...[J],PHYSICS OF PLASMAS,2022,25(1)
[22]钱沐杨, Chunsheng Ren, zhangjialiang.Fluid modeling of radical species generation mechanism in dense methane-air mixture[J],PHYSICS OF PLASMAS,2022,25(1):13519-13519
[23]Qian, Muyang, Zhong, Wangshen, Kang, Jinsong, Liu, Sanqiu, Chunsheng Ren, zhangjialiang, Wang Dezhen.Global modeling on partial oxidation of methane to oxygenates and syngas in non-equilibrium pla...[J],JAPANESE JOURNAL OF APPLIED PHYSICS,2022,59(6)
[24]Chen, Chuan-Jie, Shouzhe Li, Wu, Yue, Li, Zhen-Ye, zhangjialiang, Yongxing WANG.Experimental study of propagation characteristics of a pulse-modulated surface-wave argon plasm...[J],PHYSICS OF PLASMAS,2022,23(12)
[25]Wang, Shangmin, zhangjialiang, Shouzhe Li, Wang Dezhen.Experimental Study on the Pattern Structure of a Boundaryless, 1-D Dielectric Barrier Discharge...[J],IEEE TRANSACTIONS ON PLASMA SCIENCE,2022,42(10,SI):2328-2329
[26]Wu, Yue, Shouzhe Li, JingLin Liu, zhangjialiang.Experimental study of abatement of SF6 gas using an atmospheric-pressure oxygen microwave plasm...[J],JOURNAL OF APPLIED PHYSICS,2022,127(22)
[27]zhaoyue, Wang, Li, zhangjialiang, Hongchen Guo.Enhancing the ammonia to hydrogen (ATH) energy efficiency of alternating current arc discharge[J],INTERNATIONAL JOURNAL OF HYDROGEN ENERGY,2022,39(15):7655-7663
[28]Liu, Xiaoyang, zhangjialiang, Wang, Shangmin.Experimental and theoretical band alignment of Ta2O5/ZnO stack for heterostructured devices appli...[J],PHYSICA B-CONDENSED MATTER,2022,612
[29]Shouzhe Li, Li, Hong, zhangjialiang, Wang, Shangmin, Yongxing WANG, jinzhuji.Effect of Transmission Line on Impedance Matching of Atmospheric-Pressure Radio-Frequency Capac...[J],IEEE TRANSACTIONS ON PLASMA SCIENCE,2022,42(6):1654-1660
[30]宋巧丽, Wang Dezhen, zhangpengyun, zhangjialiang.常温下采用射频等离子体法合成碳化硅膜[J],真空,2022,42(2):27-30

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