Release Time:2019-03-10  Hits:

Indexed by: Journal Article

Date of Publication: 2008-01-25

Journal: 真空

Included Journals: ISTIC、PKU

Volume: 45

Issue: 1

Page Number: 48-50

ISSN: 1002-0322

Key Words: 热丝化学气相沉积;微晶硅薄膜;光学带隙

Abstract: 采用热丝化学气相沉积技术制备微晶硅薄膜,利用X射线衍射谱、Raman散射谱、透射光谱和扫描电子显微镜等检测手段,系统地研究沉积过程中沉积气压对微晶硅薄膜晶粒尺寸、晶态比和光学带隙的影响,运用Tacu法则对薄膜的透射率和厚度进行计算分析,得到薄膜光学带隙与沉积气压之间的关系,结果表明薄膜的光学带隙随着沉积气压的升高而单调下降.