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热丝化学气相沉积（HWCVD）中热丝直径对非晶硅薄膜沉积的影响

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Indexed by:期刊论文

Date of Publication:2011-01-01

Journal:中国科技论文在线

Included Journals:PKU

Volume:11

Issue:3

Page Number:1-5

Pre One:DBD-HWCVD 沉积硅薄膜的研究

Next One:Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
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