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论文类型：期刊论文

发表时间：2013-03-01

发表刊物：MATERIALS LETTERS

收录刊物：SCIE、EI

卷号：95

页面范围：135-138

ISSN号：0167-577X

关键字：Surface work function; InN; Thin films; Surfaces; Annealing

摘要：Annealing studies were performed to investigate the effects of heat treatment on InN thin films by changing the annealing condition from vacuum to high pressure N-2. A significant variation of similar to 400 meV in the surface work function was observed for InN films. The basic principles of Kelvin probe measurement revealed that the surface band bending E-SBB is crucial in investigating the significant changes of surface work function on the InN. The stoichiometric ratio imbalance of In and N was indirectly determined to be the main cause of the variation in band bending by analyzing the X-ray diffraction and energy dispersive X-ray measurements. Thus, the annealing treatment could be an effective method to adjust the surface work function of InN by changing the annealing condition from vacuum to high pressure N-2. (C) 2012 Elsevier B.V. All rights reserved.