个人信息Personal Information
教授
博士生导师
硕士生导师
性别:女
毕业院校:大连理工大学
学位:博士
所在单位:材料科学与工程学院
学科:材料物理与化学
办公地点:三束实验室2号楼302室
联系方式:0411-84708380-8302
电子邮箱:lixiaona@dlut.edu.cn
High thermal stability and low electrical resistivity carbon-containing Cu film on barrierless Si
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论文类型:期刊论文
发表时间:2010-05-03
发表刊物:APPLIED PHYSICS LETTERS
收录刊物:SCIE、EI
卷号:96
期号:18
ISSN号:0003-6951
关键字:annealing; carbon; copper alloys; doping; electrical resistivity; grain growth; metallic thin films; sputter deposition; thermal stability
摘要:Interfacial structures and electrical resistivities of a carbon-doped Cu film at different annealing temperatures and times were investigated. The film was prepared by magnetron sputtering on barrierless silicon. After annealing, grain growth was distinctly hindered and a carbon-containing nanometer thick passive amorphous layer was formed at the film/substrate interface. The film had a resistivity of about 2.7 mu cm after annealing at 400 degrees C for 1 h and maintained a low resistivity of 3.8 mu cm even after 9 h annealing at 400 degrees C. The low electrical resistivity in combination with the high thermal stability makes carbon doping a promising technique for future Cu interconnects on barrierless Si. (C) 2010 American Institute of Physics. [doi:10.1063/1.3427408]