李晓娜

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教授

博士生导师

硕士生导师

性别:女

毕业院校:大连理工大学

学位:博士

所在单位:材料科学与工程学院

学科:材料物理与化学

办公地点:三束实验室2号楼302室

联系方式:0411-84708380-8302

电子邮箱:lixiaona@dlut.edu.cn

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High thermal stability and low electrical resistivity carbon-containing Cu film on barrierless Si

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论文类型:期刊论文

发表时间:2010-05-03

发表刊物:APPLIED PHYSICS LETTERS

收录刊物:SCIE、EI

卷号:96

期号:18

ISSN号:0003-6951

关键字:annealing; carbon; copper alloys; doping; electrical resistivity; grain growth; metallic thin films; sputter deposition; thermal stability

摘要:Interfacial structures and electrical resistivities of a carbon-doped Cu film at different annealing temperatures and times were investigated. The film was prepared by magnetron sputtering on barrierless silicon. After annealing, grain growth was distinctly hindered and a carbon-containing nanometer thick passive amorphous layer was formed at the film/substrate interface. The film had a resistivity of about 2.7 mu cm after annealing at 400 degrees C for 1 h and maintained a low resistivity of 3.8 mu cm even after 9 h annealing at 400 degrees C. The low electrical resistivity in combination with the high thermal stability makes carbon doping a promising technique for future Cu interconnects on barrierless Si. (C) 2010 American Institute of Physics. [doi:10.1063/1.3427408]