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Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Radio-Frequency Discharge

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Indexed by:期刊论文

Date of Publication:2011-10-01

Journal:PLASMA SCIENCE & TECHNOLOGY

Included Journals:Scopus、SCIE、EI

Volume:13

Issue:5

Page Number:561-566

ISSN No.:1009-0630

Key Words:RF discharge; optical emission spectroscopy; Langmuir probe

Abstract:Optical emission spectroscopy and Langmuir Probe diagnostics were incorporated into the experiment, in which dust particles were formed in-situ by using reactive mixture gases (SiH4/C2H4/Ar) in a radio-frequency (RF) discharge plasma. The excitation temperature was first calculated by combining several optical emission spectra of argon lines and using a Boltzmann distribution to fit the experimental data, then the excitation temperature as functions of both gas pressure and RF power in SiH4/C2H4/Ar discharges for different discharge conditions were obtained. Correspondingly, based on the measurement of the electron temperature by a Langmuir probe, the excitation temperature was compared with the electron temperature, and some discussions were presented. Finally the emission intensities of spectral lines of Si 390.6 nm, Si2+ 380.6 nm and C+ 426.7 nm were measured and presented as functions of pressure, RF power and flow rate of SiH4/C2H4.

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