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Enhanced diamond deposition on Kovar alloy substrate with Al interlayer

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Indexed by:期刊论文

Date of Publication:2014-07-01

Journal:MATERIALS RESEARCH INNOVATIONS

Included Journals:SCIE、EI

Volume:18

Page Number:979-982

ISSN No.:1432-8917

Key Words:Diamond film; CVD; Kovar alloy; Interlayer; Adhesion

Abstract:During chemical vapour deposition of diamond coatings on transition metal (Fe, Co, Ni) substrates, porous graphitic carbon preferentially forms on the substrate surfaces and it induces a spontaneous spallation of the diamond films. In this study, an Al surface barrier film of 80nm thick has been used on a Kovar alloy substrate to enhance the interfacial adhesion of diamond films. Characterisation of the top deposit, interlayer and the underlying substrate was performed by Raman spectroscopy, energy dispersive X-ray analysis, scanning electron microscopy, synchrotron NEXAFS, and X-ray diffraction. The Al interlayer has effectively inhibited the formation of intermediate graphitic carbon and markedly enhanced the adhesion of diamond films. Continuous and adherent diamond films were achieved on the alloy substrate. This investigation also indicates the importance of the continuity of the Al interlayer in maintaining an integrity of the adherent diamond films.

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