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Indexed by:期刊论文

Date of Publication:2012-08-25

Journal:SURFACE & COATINGS TECHNOLOGY

Included Journals:SCIE、EI、Scopus

Volume:207

Page Number:328-333

ISSN No.:0257-8972

Key Words:Diamond; Plasma CVD; Steel; Ion implantation; Sputtering; Surface modification

Abstract:Graphite carbon preferentially forms on steel substrates during CVD diamond synthesis process, resulting in poor interface adhesion along with severe carburization-induced substrate damage. In this study, an ion implantation or a sputtering deposition of Al has been carried out to modify steel substrates to enhance diamond deposition. The Al surface modification effectively inhibited formation of intermediate graphite layer, therefore markedly enhances the adhesion of diamond films produced. For the Al-ion implanted steels, the level of substrate carburization damage is dose-dependent and improved significantly with an increasing Al implantation dose from 5 x 10(16) ions/cm(2) to 2 x 10(17) ions/cm(2). Continuous and adherent diamond films are formed on the steel substrate modified by an ion-beam sputtered Al film. The fundamental growth mechanism is discussed. (C) 2012 Elsevier B.V. All rights reserved.