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论文类型：期刊论文

发表时间：2016-07-01

发表刊物：JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

收录刊物：SCIE、EI、Scopus

卷号：27

期号：7

页面范围：7699-7706

ISSN号：0957-4522

摘要：In the electromigration tests performed with the Cu/liquid Sn/Cu samples of effective Sn lengths and under current densities of and respectively at , the thickness increments of anode intermetallic compounds were in-situ observed using synchrotron radiation imaging technique. The size of the compound attained for the smaller sample at reflow time of 1 h was whereas the larger specimen yielded a thickness value by the end of 45 min. Though the magnitude of effective charge number for electromigration is reduced at higher current density values, it is revealed that the net effect of bigger current intensity is always the built up of thicker intermetallic compound. Additionally, the raise in medium temperature caused by greater joule heating in samples corresponding to bigger current density, can be associated with the increment of transport of Cu from cathode to anode. Owing to the slower diffusion phenomena in larger specimens, the electromigration enhanced growth of the compound is more pronounced at the later stage of the experiment. The numerical model for advection-diffusion of Cu species was implemented using finite element method.