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论文类型：期刊论文

发表时间：2012-08-25

发表刊物：SURFACE & COATINGS TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：207

页面范围：328-333

ISSN号：0257-8972

关键字：Diamond; Plasma CVD; Steel; Ion implantation; Sputtering; Surface modification

摘要：Graphite carbon preferentially forms on steel substrates during CVD diamond synthesis process, resulting in poor interface adhesion along with severe carburization-induced substrate damage. In this study, an ion implantation or a sputtering deposition of Al has been carried out to modify steel substrates to enhance diamond deposition. The Al surface modification effectively inhibited formation of intermediate graphite layer, therefore markedly enhances the adhesion of diamond films produced. For the Al-ion implanted steels, the level of substrate carburization damage is dose-dependent and improved significantly with an increasing Al implantation dose from 5 x 10(16) ions/cm(2) to 2 x 10(17) ions/cm(2). Continuous and adherent diamond films are formed on the steel substrate modified by an ion-beam sputtered Al film. The fundamental growth mechanism is discussed. (C) 2012 Elsevier B.V. All rights reserved.