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电子束轰击作用下硅熔体非均态界面区挥发性杂质P运动机理的研究

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Leading Scientist:Yi Tan

Supported by:主管部门科技项目

Status:结题

Supported by:教育部科技发展中心

Nature of Project:纵向

Project Approval Number:20130041110004

Date of Project Approval:2013-10-28

Scheduled completion time:2016-12-31

Date of Project Initiation:2014-01-01

Date of Project Completion:2017-05-01

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