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一种高纯多晶硅溅射靶材及其制备方法和应用

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First Author:lipengting

Disigner of the Invention:shishuang,张磊,Yi Tan,jiangdachuan,wangfeng,孟剑雄

Affilication of Author(s):材料科学与工程学院

Application Number:CN108359949A

Authorization number:CN201810134015.5

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