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Paper Publications

[71]Jiang, Dachuan, Ren, Shiqiang, Shi, Shuang, Dong, Wei, Qiu, Jieshan, Tan, Yi, Li, Jiayan, DC (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116023, Peoples R China..Phosphorus Removal from Silicon by Vacuum Refining and Directional Solidification[J],JOURNAL OF ELECTRONIC MATERIALS,2014,43(2):314-319
[72]Xu, Fumin, Wu, Shenrui, Tan, Yi, Li, Jiayan, Yaqiong, Liu, Yao, FM (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China..Boron Removal from Metallurgical Silicon using Si-Al-Sn Ternary Alloy[J],SEPARATION SCIENCE AND TECHNOLOGY,2014,49(2):305-310
[73]Li, Yaqiong, Tan, Yi, Jiayan, Xu, Qiang, Liu, Yao, JY (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China..Effect of Sn content on microstructure and boron distribution in Si-Al alloy[J],JOURNAL OF ALLOYS AND COMPOUNDS,2014,583:85-90
[74]游小刚, 谭毅(导师), 李佳艳.采用原位反应法在石墨坩埚表面制备SiC涂层[J],机械工程材料,2014,38(6):50-55
[75]谭毅, 李佳艳, 姜大川.New method of boron removal from silicon by electron beam injection[J],Materials Science in Semiconductor Processing,2014,18(2):42-45
[76]Zhang, Lei, Tan, Yi, Li, Jiayan, Liu, Yao, Wang, Dengke, JY (reprint author), Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China..Study of boron removal from molten silicon by slag refining under atmosphere[J],MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,2013,16(6):1645-1649
[77]李佳艳, 李超超, 李亚琼, 谭毅, Tan, Y., School of Materials Science, Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China, email: tanyi@dlut.edu.cn.多晶硅精炼提纯过程中铝硅合金的低温电解分离[J],材料工程,2013,11:1-5,11
[78]李佳艳, 游小刚, 谭毅, 郭素霞, Li, J.-Y.(lijiayan@dlut.edu.cn).多孔硅吸杂对单晶硅片电性能的影响[J],人工晶体学报,2013,42(11):2364-2368,2379
[79]李佳艳, 谭毅.电子束熔炼制备太阳能级多晶硅[A],2013,361-361
[80]李佳艳, 贾朋军, 刘瑶, 李亚琼, 曹盼盼, 谭毅.合金精炼提纯过程中金属锡的电解回收研究[A],2013,51-51

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