Current position: Home >> Scientific Research >> Paper Publications

Unintentionally doped high resistivity GaN layers with an InGaN interlayer grown by MOCVD

Release Time:2024-12-06  Hits:

Date of Publication: 2022-10-03

Journal: RSC Advances

Volume: 6

Issue: 65

Page Number: 60068-60073

ISSN: 2046-2069

Prev One:The properties of reversed polarization yellow InGaN-GaN MQWs in p-side down structure grown by metal-organic chemical vapor deposition on sapphire substrate

Next One:Vertically conducting deep-ultraviolet light-emitting diodes with interband tunneling junction grown on 6H-SiC substrate