Nq0su2vDs2ycKzUFvd9J6JDQsxCzlzOxEgCKbixdAvrDoquZnTYetZQI8Ae3
Current position: Home >> Scientific Research >> Paper Publications

Residual Stress Distribution in Silicon Wafers Machined by Rotational Grinding

Release Time:2023-01-19  Hits:

Date of Publication: 2022-10-08

Journal: JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING TRANSACTIONS OF THE ASME

Institution: 机械工程学院

Volume: 139

Issue: 8

ISSN: 1087-1357

Prev One:Sensitivity analysis of the surface integrity of monocrystalline silicon to grinding speed with same grain depth-of-cut

Next One:Preparation of Flat and Smooth Copper Surface by Jet Electrochemical Machining and Electrochemical Polishing