Hits:
Date of Publication:2024-04-23
Journal:中国科学基金
Issue:01
Page Number:99-114
Key Words:原子层制造; 原子层制造工艺与装备; 原子层抛光; 原子层损伤控制; 原子层沉积/刻蚀
Pre One:Optimization of grinding process for hard and brittle materials based on damage evolution mechanism
Next One:基于SiPESC平台的雷诺方程有限元分析与软件研发