Surface microtopography evolution of monocrystalline silicon in chemical mechanical polishing
Release Time:2024-06-13 Hits:
Indexed by: Journal Papers
Document Code: 391321
Date of Publication: 2024-07-10
Journal: JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
Volume: 328
ISSN: 0924-0136
Key Words: CONTACT; GLASS; PAD; PARTICLE-SIZE; ROUGHNESS; STRESS; SUBSTRATE; WEAR