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Surface microtopography evolution of monocrystalline silicon in chemical mechanical polishing

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Date of Publication:2024-05-22

Journal:Journal of Materials Processing Technology

Volume:328

ISSN No.:0924-0136

Key Words:Acceleration; Atomic removal form; Chemical mechanical polishing; Curve fitting; Frequency features; High spatial frequency; High-spatial-frequency roughness; Mechanical; Mechanical action; Molecular dynamics; Power spectral density; Reaction kinetics; Spatial frequency; Surface microtopography; Surface microtopography evolution; Surface roughness; Ultra smooth surface

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