Modeling of surface microtopography evolution in chemical mechanical polishing considering chemical-mechanical synergy
Release Time:2024-11-18 Hits:
Date of Publication: 2024-10-19
Journal: TRIBOLOGY INTERNATIONAL
Volume: 201
ISSN: 0301-679X
Key Words: ABRASIVES; MATERIAL REMOVAL RATE; POWER SPECTRAL DENSITY; ROUGHNESS; SILICON; WEAR