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个人信息Personal Information
教授
博士生导师
硕士生导师
性别：男
毕业院校：大连理工大学
学位：博士
所在单位：机械工程学院
学科：机械制造及其自动化
办公地点：机械工程学院高性能制造研究所#5015室
联系方式：手机：15104088992
电子邮箱：gaoshang@dlut.edu.cn
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First-principles insights into the synergistic chemical-mechanical removal mechanism of 4H-SiC in chemical mechanical polishing
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发表时间：2025-10-24
发表刊物：APPLIED SURFACE SCIENCE
卷号：710
ISSN号：0169-4332
关键字：CMP; COVALENT RADII; DENSITY; LASER; OXIDATION; SEMICONDUCTOR; TEMPERATURE
上一条：Catalytic performance and efficient processing mechanism in photocatalysis-assisted chemical mechanical polishing of yttrium aluminum garnet with UV-MnFe2O4/PMS photocatalytic system
下一条：Saw marks prediction model and experimental verification in multi-wire reciprocating rocking sawing of monocrystalline silicon