Personal Information

Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[71]Sun, Xiao-Yan, Zhang, Yu-Ru, Li, Xue-Chun, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China..Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-v...[J],CHINESE PHYSICS B,2017,26(1)
[72]Zhang, Yu-Ru, Van Laer, Koen, Neyts, Erik C., Bogaerts, Annemie, A (reprint author), Univ Antwerp, Dept Chem, Res Grp PLASMANT, Univ Pl 1, BE-2610 Antwerp, Belgium..Can plasma be formed in catalyst pores? A modeling investigation[J],APPLIED CATALYSIS B-ENVIRONMENTAL,2016,185:56-67
[73]Zhang, Ya, Wang, Hong-yu, Yu-ru, Bogaerts, Annemie, A (reprint author), Univ Antwerp, Dept Chem, Res Grp PLASMANT, B-2610 Antwerp, Belgium..Formation of microdischarges inside a mesoporous catalyst in dielectric barrier discharge plasm...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2017,26(5)
[74]Liang, Ying-Shuang, Zhang, Yu-Ru, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Influence of dielectric materials on uniformity of large-area capacitively coupled plasmas for ...[J],CHINESE PHYSICS B,2016,25(10)
[75]Zhang, Yu-Ru, Gao, Fei, Li, Xue-Chun, Bogaerts, Annemie, Wang, You-Nian, YR (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Fluid simulation of the bias effect in inductive/capacitive discharges[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(6)
[76]Zhang, Yu-Ru, Tinck, Stefan, De Schepper, Peter, Wang, You-Nian, Bogaerts, Annemie, YR (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Modeling and experimental investigation of the plasma uniformity in CF4/O-2 capacitively couple...[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(2)
[77]Zhao, Shu-Xia, Bogaerts, Annemie, Wang, You-Nian, Gao, Fei, Zhang, Yu-Ru, SX (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China..Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study[J],JOURNAL OF APPLIED PHYSICS,2015,117(24)
[78]Liu, Yong-Xin, Zhang, Yu-Ru, Bogaerts, Annemie, Wang, You-Nian, YX (reprint author), Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Sch Phys & Optoelect Technol, Minist Educ, Dalian 116024, Peoples R China..Electromagnetic effects in high-frequency large-area capacitive discharges: A review[J],JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(2)
[79]Sun, Xiao-Yan, Zhang, Yu-Ru, Li, Xue-Chun, Wang, You-Nian, XY (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Modulations of the plasma uniformity by low frequency sources in a large-area dual frequency in...[J],PHYSICS OF PLASMAS,2015,22(5)
[80]Xu, Hui-Jing, Wang, You-Nian, Li, Xue-Chun, Gao, Fei, Zhang, Yu-Ru, Zhao, Shu-Xia, HJ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Equivalent circuit effects on mode transitions in H-2 inductively coupled plasmas[J],PHYSICS OF PLASMAS,2015,22(4)

total96 8/10

first previous next last Page

Home

Scientific Research

Teaching Research

Awards and Honours

Enrollment Information

Student Information

My Album

Blog

Personal Information

Paper Publications