个人信息Personal Information
副教授
硕士生导师
性别:女
毕业院校:北京大学
学位:博士
所在单位:集成电路学院
学科:微电子学与固体电子学
办公地点:大连理工大学开发区校区信息楼211-1
电子邮箱:hqzhang@dlut.edu.cn
Effect of different annealing temperature on Sb-doped ZnO thin films prepared by pulsed laser deposition on sapphire substrates
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论文类型:期刊论文
发表时间:2011-03-15
发表刊物:APPLIED SURFACE SCIENCE
收录刊物:SCIE、EI
卷号:257
期号:11
页面范围:5121-5124
ISSN号:0169-4332
关键字:Sb-doped ZnO; Pulsed laser deposition; Hall-effect-measurement; X-ray diffraction; Scan electronic microscopy; Photoluminescence spectra
摘要:Influence of annealing temperature on the properties of Sb-doped ZnO thin films were studied. Hall measurement results indicated that the Sb-doped ZnO annealed at 950 degrees C was p-type conductivity. X-ray diffraction (XRD) results indicated that the Sb-doped ZnO thin films prepared at the experiments are high c-axis oriented. It was worth noting that p-type sample had the worst crystallinity. The measurements of low-temperature photoluminescence (PL) spectra indicate that the sample annealed at the temperatures of 950 degrees C showed strong acceptor-bound exciton (A(0)X) emission, and confirmed that it is related to Sb-doping by comparing with the undoped ZnO low-temperature PL spectrum. (C) 2011 Elsevier B.V. All rights reserved.