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Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition

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Indexed by:Journal Papers

Date of Publication:2016-01-01

Journal:MATERIALS

Included Journals:SCIE、EI、PubMed

Volume:9

Issue:1

ISSN No.:1996-1944

Key Words:BTO; Thin film; Crack-free; E-jet deposition

Abstract:Dense and crack-free barium titanate (BaTiO3, BTO) thin films with a thickness of less than 4 mu m were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height and line-to-line pitch of the deposition on the micro-structure of BTO thin films were investigated. Results show that crack-free BTO thin films can be prepared with 4 mm jet height and 300 mu m line-to-line pitch in this work. Dielectric constant of the prepared BTO thin film was recorded as high as 2940 at 1 kHz at room temperature. Meanwhile, low dissipation factor of the BTO thin film of about 8.6% at 1 kHz was also obtained. The layer-by-layer E-jet deposition technique developed in this work has been proved to be a cost-effective, flexible and easy to control approach for the preparation of high-quality solid thin film.

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