大连理工大学  登录  English 
赵宁
点赞:

教授   博士生导师   硕士生导师

主要任职: 材料科学与工程学院副院长

性别: 男

毕业院校: 大连理工大学

学位: 博士

所在单位: 材料科学与工程学院

学科: 材料学

电子邮箱: zhaoning@dlut.edu.cn

手机版

访问量:

开通时间: ..

最后更新时间: ..

Interfacial Reaction in Cu/Sn/Cu Fine Pitch Interconnect during Soldering

点击次数:

论文类型: 会议论文

发表时间: 2013-08-11

收录刊物: EI、CPCI-S、Scopus

页面范围: 382-+

关键字: fine pitch interconnect; Cu/Sn/Cu; interfacial reaction; intermetallic compound; growth kinetics

摘要: The interfacial reaction in Cu/Sn/Cu fine pitch interconnects during soldering at 250 degrees C was investigated in the present work. The morphological evolution and growth kinetics of the interfacial intermetallic compounds (IMCs) were studied. Cu6Sn5 scallops formed at the Sn/Cu interface and ripened with increasing reaction time. The dependence of average grain number on reaction time t followed t(-0.70) relationship. During the solid-liquid interfacial reaction, different growth behavior of interfacial Cu6Sn5 scallops presented between the direction vertical to the interface and that parallel to the interface. According to the ratio of R/H, the growth of interfacial Cu6Sn5 could be divided into three stages, i.e., the initial stage, the ripening stage and the thickening stage. The growth of Cu6Sn5 scallops was controlled by grain boundary diffusion, while that of Cu3Sn was controlled by volume diffusion.

辽ICP备05001357号 地址:中国·辽宁省大连市甘井子区凌工路2号 邮编:116024
版权所有:大连理工大学