Release Time:2023-03-30 Hits:
Date of Publication: 2022-10-09
Journal: 表面技术
Volume: 49
Issue: 5
Page Number: 11-18
ISSN: 1001-3660
Note: 新增回溯数据
Prev One:Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature
Next One:采用ECR-PECVD技术低温生长多晶硅薄膜