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Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature

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Date of Publication:2022-10-09

Journal:7th Pacific Rim International Conference on Advanced Materials and Processing

Affiliation of Author(s):材料科学与工程学院

Volume:654-656

Page Number:1712-+

ISSN No.:0255-5476

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