Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature
Release Time:2023-03-30 Hits:
Date of Publication: 2022-10-09
Journal: 7th Pacific Rim International Conference on Advanced Materials and Processing
Institution: 材料科学与工程学院
Volume: 654-656
Page Number: 1712-+
ISSN: 0255-5476