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    高飞

    • 教授     博士生导师 硕士生导师
    • 主要任职:集成电路学院党委书记
    • 性别:男
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:集成电路学院
    • 学科:等离子体物理
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    Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition

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      发布时间:2019-03-09

      论文类型:期刊论文

      发表时间:2012-07-01

      发表刊物:CHINESE PHYSICS B

      收录刊物:Scopus、ISTIC、EI、SCIE

      卷号:21

      期号:7

      ISSN号:1674-1056

      关键字:mode transition; inductively coupled plasma; Langmuir probe; ICCD

      摘要:A Langmuir probe and an ICCD are employed to study the discharge mode transition in Ar inductively coupled plasma. Electron density and plasma emission intensity are measured during the E (capacitive discharge) to H (inductive discharge) mode transitions at different pressures. It is found that plasma exists with a low electron density and a weak emission intensity in the E mode, while it has a high electron density and a strong emission intensity in the H mode. Meanwhile, the plasma emission intensity spatial (2D image) profile is symmetrical in the H mode, but the 2D image is an asymmetric profile in the E mode. Moreover, the electron density and emission intensity jump up discontinuously at high pressure, but increase almost continuously at the E to H mode transition under low pressure.