高飞

1061

  • 教授     博士生导师   硕士生导师
  • 主要任职:物理学院副院长
  • 性别:男
  • 毕业院校:大连理工大学
  • 学位:博士
  • 所在单位:物理学院
  • 学科:等离子体物理
  • 电子邮箱:fgao@dlut.edu.cn

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开通时间:2016.11.3

最后更新时间:2016.11.3

The effect of F-2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma

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论文类型:期刊论文

发表时间:2012-04-01

发表刊物:PLASMA SOURCES SCIENCE & TECHNOLOGY

收录刊物:SCIE、EI、Scopus

卷号:21

期号:2

ISSN号:0963-0252

摘要:The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F-2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F-2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.