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个人信息Personal Information
工程师
性别：男
毕业院校：大连理工大学
学位：硕士
所在单位：集成电路学院
电子邮箱：lyang@dlut.edu.cn
Low Al-composition p-GaN/Mg-doped Al0.25Ga0.75N/n(+)-GaN polarization-induced backward tunneling junction grown by metal-organic chemical vapor deposition on sapphire substrate
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论文类型：期刊论文
发表时间：2014-09-10
发表刊物：SCIENTIFIC REPORTS
收录刊物：SCIE、PubMed
卷号：4
页面范围：6322
ISSN号：2045-2322
摘要：Low Al-composition p-GaN/Mg-doped Al0.25Ga0.75N/n(+)-GaN polarization-induced backward tunneling junction (PIBTJ) was grown by metal-organic chemical vapor deposition on sapphire substrate. A self-consistent solution of Poisson-Schrodinger equations combined with polarization-induced theory was used to model PIBTJ structure, energy band diagrams and free carrier concentrations distribution. The PIBTJ displays reliable and reproducible backward tunneling with a current density of 3 A/cm(2) at the reverse bias of -1 V. The absence of negative differential resistance behavior of PIBTJ at forward bias can mainly be attributed to the hole compensation centers, including C, H and O impurities, accumulated at the p-GaN/Mg-doped AlGaN heterointerface.