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个人信息Personal Information
副教授
硕士生导师
性别：男
毕业院校：大连理工大学
学位：博士
所在单位：物理学院
学科：凝聚态物理
办公地点：大连理工大学物理学院三束材料改性教育部重点实验室厚望楼220房间
电子邮箱：chunyuma@dlut.edu.cn
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Latest development of gate materials with high dielectric constant
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论文类型：期刊论文
发表时间：2004-12-01
发表刊物：Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology
收录刊物：EI
卷号：24
期号：SUPPL.
页面范围：28-32
ISSN号：02539748
摘要：Latest development of gate materials with high dielectric constant was tentatively reviewed with discussion centered on various materials processing technologies, the technical limitations, its applications in fabrication of integrated circuits with sub-micron feature size, and its development trends in a thought provoking way.