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    王立达

    • 副教授       硕士生导师
    • 性别:男
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:化工学院
    • 学科:化学工程
    • 办公地点:大连理工大学西部校区化工综合楼A506
    • 电子邮箱:ldwang@dlut.edu.cn

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    Effects of introduced electrolytes on galvanic deposition of ZnO films

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    论文类型:期刊论文

    发表时间:2010-09-01

    发表刊物:ELECTROCHIMICA ACTA

    收录刊物:SCIE、EI

    卷号:55

    期号:22

    页面范围:6796-6801

    ISSN号:0013-4686

    关键字:Electrolyte; Galvanic deposition; ZnO; Zinc hydroxysulfate; Passivation

    摘要:The effects of supporting electrolytes on galvanic deposition of ZnO films have been investigated in detail by respectively introducing K2SO4. KNO3 and KCI into Zn(Ac)(2) electrolytes. It reveals that the chemical nature of introduced electrolytes plays important roles in acting on the growth of ZnO films. ZnO nanorods tend to grow in KNO3 and KCI electrolytes, while sheet-like zinc hydroxysulfate tends to be formed in K2SO4 electrolyte. Besides. KNO3 electrolyte is inclined to accelerate the passivation of Zn anode, resulting in the sharp decrease of driving force for galvanic deposition. In contrast, KCI and K2SO4 electrolytes facilitate zinc dissolution by anionic adsorption on the metal surface and subsequent participation in the active dissolution process, thus leading to the incorporation of anions in nanocrystals. (c) 2010 Elsevier Ltd. All rights reserved.