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发布时间：2021-03-02
论文类型：期刊论文
发表时间：2021-01-10
发表刊物：Vacuum
卷号：195
期号：5
页面范围：109506-109506
上一条：Development of NiCr/NiSi thin-film thermocouple sensor for workpiece temperature measurement in chemical explosive material machining
下一条：Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering
