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发表时间:2022-10-02
发表刊物:JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING TRANSACTIONS OF THE ASME
卷号:128
期号:1
页面范围:175-179
ISSN号:1087-1357
上一条:EFFECT OF NITROGEN-DOPED CONCENTRATION ON THE TCR OF ITO THIN FILMS AT HIGH TEMPERATURE
下一条:Investigation of temperature-dependent ferroelectric Properties of Y-doped HfO2 thin film prepared by middle-frequency reactive magnetron co-sputtering