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发表时间:2022-10-03
发表刊物:真空
卷号:179
ISSN号:0042-207X
上一条:Investigation of temperature-dependent ferroelectric Properties of Y-doped HfO2 thin film prepared by middle-frequency reactive magnetron co-sputtering
下一条:Improved inflection point method of emissive probe for accurate measurement of plasma potential