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论文类型：期刊论文

发表时间：2012-03-15

发表刊物：SURFACE & COATINGS TECHNOLOGY

收录刊物：SCIE、EI

卷号：206

期号：14

页面范围：3159-3164

ISSN号：0257-8972

关键字：Micro-crystalline silicon; Magnetron sputtering; Inductively coupled plasma; Langmuir probe; Optical emission spectrum

摘要：Hydrogenated microcrystalline silicon thin films (mu c-Si:H) were deposited by remote inductively coupled plasma assistant pulsed dc twin magnetron sputtering at temperatures below 300 degrees C. The formation of mu c-Si:H was only found in the environment of hydrogen plasma, where Ar and H-2 mixed gas was used. In pure argon plasma or without the assistance of ICP in the Ar/H-2 gas mixtures, all the samples were amorphous structure. It suggested that ICP hydrogen plasma which enhanced the density and energy of H radicals played the key role in the formation of mu c-Si:H films. (C) 2011 Elsevier B.V. All rights reserved.