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论文类型：期刊论文

发表时间：2009-04-01

发表刊物：CHINESE PHYSICS B

收录刊物：SCIE、EI、ISTIC、CSCD、Scopus

卷号：18

期号：4

页面范围：1570-1573

ISSN号：1674-1056

关键字：hard disk overcoat; ultra-thin; a-SiNx; plasma enhanced magnetron sputtering

摘要：This paper reports that amorphous silicon nitride (a-SiNx) overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNx overcoat has better anti-corrosion properties than that of reference a-CNx overcoats (2 4.5nm). The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si-N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS < 0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.