Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light
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- 论文类型：期刊论文
- 发表时间：2014-03-01
- 发表刊物：CHEMICAL VAPOR DEPOSITION
- 收录刊物：EI、SCIE、Scopus
- 卷号：20
- 期号：1-3
- 页面范围：8-13
- ISSN号：0948-1907
- 摘要：Afacile and fast CVD method for the deposition of TiO2 films, under atmospheric pressure and at room temperature, onto glass and polyethylene terephthalate (PET) substrates is explored. The hydrolysis reaction of titanium tetraisopropoxide (TTIP) is employed for the deposition of TiO2 film, and the corresponding deposition rate determined. The surface morphology of the as-deposited TiO2 films is observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In order to confirm the structure, composition, and optical properties of the films, X-ray diffraction (XRD), Raman spectroscopy (RS), Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and UV-Vis absorption spectroscopy are employed. The as-deposited TiO2 films are amorphous with a band gap energy of around 3.42 eV and rich in surface OH groups, which exhibit very high photocatalytic activity for complete oxidation of HCHO in simulated air under UV-C irradiation. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
- 发表时间：2014-03-01
